Oxidative Addition Reactions of Low?Valent Gallium Compounds with Primary Phosphanes
نویسندگان
چکیده
Oxidative addition reactions of (Dipp2NacNac)Ga with the primary silylphosphanes R2R'Si-PH2 in toluene led to phospha-gallanes (Dipp2NacNac)GaH(PHSiR2R’); R=R’=Me (1), R=Me, R’=Thex (2), R=R’=iPr (3) and R=Ph, R’=tBu (4). The same reaction starting from diphosphane iPr2Si(PH2)2 yields digallane {(Dipp2NacNac)GaH(PH)}2(SiiPr2) (5 a). In contrast, hypersilylphosphane resulted elimination (Me3Si)3SiH formation diphospha-gallane (Dipp2NacNac)Ga(PH2)(PHSi(SiMe3)3) (6). organo-phosphane tBuPH2 shows a similar behavior though both di- monophospha-gallanes (Dipp2NacNac)GaX(PHtBu) (7 a: X=PH2, 7 b: X=H) occur. row used solvents, only pyridine selective b thus we tested influence this solvent on one equivalent which compound (Dipp2NacNac)GaH(PHSiiPr2PH2) b). Additionally, derivative 3, (Dipp2NacNac)GaCl(PHSiiPr3) (8), an Cl atom bond gallium instead hydrogen was obtained by (Dipp2NacNac)GaCl2 iPr3SiPHLi.
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ژورنال
عنوان ژورنال: European Journal of Inorganic Chemistry
سال: 2021
ISSN: ['1434-1948', '1099-0682']
DOI: https://doi.org/10.1002/ejic.202100723